Dependence of Atomic-Scale Si(110) Surface Roughness on Hydrogen Introduction Temperature after High-Temperature Ar Annealing

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ISSN Print: 2161-4881
ISSN Online: 2161-489X
www.scirp.org/journal/jsemat
E-mail: jsemat@scirp.org

Citations

"Dependence of Atomic-Scale Si(110) Surface Roughness on Hydrogen Introduction Temperature after High-Temperature Ar Annealing"
written by Koji Araki, Ryuji Takeda, Haruo Sudo, Koji Izunome, Xinwei Zhao,
published by Journal of Surface Engineered Materials and Advanced Technology, Vol.4 No.5, 2014

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