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A Method of Via Variation Induced Delay Computation
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由 M Kim 著作2020 — A novel variation-aware delay computation method for vias is proposed. Our experiments show that this method can reduce over five percent of pessimism in ...
A Method of Via Variation Induced Delay Computation
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由 M Kim 著作2020 — Our experiments show that this method can reduce over five percent of pessimism in arrival time calculation when it is compared with state of the art solutions.
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A method of via variation induced delay computation | Proceedings ...
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In this paper, a novel variation-aware delay computation method for vias is proposed. Our experiments show that this method can reduce over five percent of ...
Nathaniel Conos
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A method of via variation induced delay computation. M Kim, Y Heo, S Jung, K Le, N Conos, H Fatemi, J Lee, Y Shin. 2020 Design, Automation & Test in Europe ...
Nathaniel Conos - Google 學術搜尋
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A method of via variation induced delay computation. M Kim, Y Heo, S Jung, K Le, N Conos, H Fatemi, J Lee, Y Shin. 2020 Design, Automation & Test in Europe ...
Delay Variation - an overview
ScienceDirect.com
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ScienceDirect.com
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Delay variation refers to the fluctuation in timing of information delivery, often considered alongside end-to-end delay.
Process-Induced Delay Variation in SWCNT, MWCNT, and ...
ResearchGate
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ResearchGate
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2024年10月22日 — This paper deals with an analysis of propagation delay in carbon nanotube (CNT) bundled interconnects under process-induced variations.
Delay-induced switched states in a slow–fast system - PMC
National Institutes of Health (NIH) (.gov)
https://pmc.ncbi.nlm.nih.gov › articles
National Institutes of Health (NIH) (.gov)
https://pmc.ncbi.nlm.nih.gov › articles
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由 S Ruschel 著作2019被引用 7 次 — In this paper, we study these delay-induced switched states. We provide conditions for their existence and show how the formal limits ε → 0 and/or η → 0 ...
(PDF) Crosstalk-Induced Delay, Noise, and Interconnect ...
ResearchGate
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2024年10月22日 — In this paper, we investigate the crosstalk-induced delay, noise, and chemical mechanical polishing (CMP)-induced thickness-variation ...
Compensation for Lithography Induced Process Variations ...
EECS at Berkeley
https://www2.eecs.berkeley.edu › EECS-2011-36
EECS at Berkeley
https://www2.eecs.berkeley.edu › EECS-2011-36
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由 E Chin 著作2011被引用 4 次 — The delay response of each double patterned interconnect structure is fit with a second order polynomial model with focus, exposure, and ...
88 頁