No abstract available

[en] The coatings of carbonate-hydroxyapatite (CHA) on materials suitable for implants must have, because of their shielding functions, sufficiently large thickness and good adhesion. For these reasons, the production of these coatings is a technological task whose solution may be obtained on the basis of the application of different ion-plasma technologies. Examination of the properties of the CHA coatings on the substrate of titanium and the effect on the materials of the coating and the substrate of ion-plasma technology with the application of high-frequency discharge was the aim of this investigation

[en] The study of the growth mechanism of thin amorphous films during plasma enhanced chemical vapour deposition, requires the simultaneous study of both the plasma state as well as the nature of the thin film surface during growth. Since the growth under these non-equilibrium growth conditions is kinetic in nature, identification of the various radicals and ions by means of a variety plasma diagnostics is needed. In this presentation I will discuss the progress we made in the understanding of the fast deposition of hydrogenated amorphous silicon and carbon and silicon oxide like films. The talk will emphasize the importance of plasma phase diagnostics such as cavity ring down spectroscopy and appearance potential mass spectrometry for radical detection. Furthermore the combination of the information obtained from these studies with in situ film diagnostics such as IR attenuated total internal reflection absorption spectroscopy and spectroscopic ellipsometry to characterize the physical and chemical state of the film surface will be highlighted. (Author)

[en] The present volume contains the proceedings of the 13. European Conference on Chemical Vapor Deposition (EUROCVD 13). CVD is one of the major techniques for the fabrication of micro- and nano-scale films, tubes, and particles. Enhanced implementation of CVD in actual and forthcoming advanced industrial processes will depend on the comprehension, control, and optimization of the 'processing conditions - deposit microstructure (morphology, composition) - material performance' relations. EUROCVD 13 was recognized by the European Commission as a High Level Scientific Conference which meets clearly identified needs, such as: deeper insight into the fundamental phenomena which control the above correlation; identification of the materials issues where CVD can be used, scale up of the process, and co-ordination among chemical suppliers, equipment designers, software developers, and end-users; contribution to the improvement of the quality of life (as a consequence of enhanced performance of the materials produced, through the developments in fields such as microelectronics, energy storage, or hard and protective coatings; teaching and training of young researchers on the multiple aspects of CVD, and their interactions with the specialists in these fields. (authors)

[en] The current trend in the structural design philosophy is based on the use of substrate with the necessary mechanical properties and a thin coating to exhibit surface properties. Plasma spray process is a versatile surface coating technique which finds extensive application in meeting advance technologies. This report describes the plasma spray technique and its use in developing coatings for various applications. The spray system is desribed in detail including the different variables such as power input to the torch, gas flow rate, powder properties, powder injection, etc. and their interrelation in deciding the quality of the coating. A brief write-up on the various plasma spray coatings developed for different applications is also included. (author). 15 refs., 15 figs., 2 tabs

[en] It is shown that for the uniform deposition of thin film onto the inner surface of the cylindrical channel the certain temperature distribution along the channel wall must be formed. The equations for such temperature distribution are obtained both for physical and chemical deposition. The temperature distribution along the channel leading to the uniform deposition sufficiently depends on kind of the deposition process. In the physical deposition with symmetric conditions when the pressure of the deposition component is equal at both ends of the channel the temperature distribution leading to the uniform deposition has a minimum in the centre of the channel. In the chemical deposition the temperature distribution leading to the uniform deposition depends sufficiently on the ratio of the activation energy of heterogeneous chemical reaction and the desorption energy of reactant molecules. Some problems related to the foreign molecule trapping by the film deposited on the channel wall are also discussed. (Authors)

[en] In plasma spraying the thermal resistance of the growing solidified layer causes the growth of the surface temperature. In certain condition the full rate of droplets cannot be solidified. These critical conditions are found in this paper for a simple geometry. (author)

[en] A short review of equipment for ion-plasma deposition by vacuum-arc method is presented. Results of works in development of high efficient end face plasma sources, vacuum-arc evaporators, magnetic filters for plasma cleaning, devices for coating formation arc given

[en] Designation, design and operation data of powder-plasma surfacing apparatus for surfacing of machine parts exposed to wear and operating at high temperatures are described. The apparatus enables to produce smooth layers up to 5 mm thick and up to 35 mm wide with a minimum of penetration. (author)

[en] A new spray technology for producing hard-coatings, has been developed at the SOREQ Nuclear Research Center. The concept is based on the extensive experience accumulated at SOREQ in the course of the development of Electrothermal (ET), Electrothermal-Chemical (ETC) and Solid-Propellant Electrothermal-Chemical (SPETC) guns(r). High quality coatings may be obtained by thermal spraying powder particles onto a variety of substrates. Mature state-of-the-art technologies such as plasma spray, high velocity oxy fuel (HVOF) and detonation gun (D-Gun) are widely used for many applications. As each method has its own drawbacks there is a need for a combination of several parameters which cannot be achieved by any existing individual commercial technology. The method presented is oriented toward a high-quality, multi-step, high-throughput, easily programmable continuous coating process and relatively inexpensive technology. The combustion products of a solid or liquid propellant accelerate the powder particles of the coating material. A pulsed-plasma jet, provided by a confined capillary discharge, ignites the propellant and controls the combustion process. The powder particles are accelerated to velocities over 1000 m/s. Due to the very high carrier gas density, high velocity, high throughput and high powder consumption efficiency are obtained. The plasma jet enables control of the gas temperature and consequently influences the powder temperature