[en] The basic mechanisms of film growth, transformation, and dissolution of phases formed on surfaces are discussed. Film growth can occur via solid-state processes or via substrate (usally metal or alloy) dissolution, followed by local supersaturation and precipitation of an insoluble phase. The phase(s) formed may be metastable and transform to a more stable phase, via either solid-state or dissolution-reprecipitation processes. Film dissolution reactions can also occur via a variety of mechanisms, including: (i) direct chemical dissolution when no oxidation state change occurs; (ii) redox dissolution when the film dissolves via a redox reaction involving a reducing or oxidizing agent in solution; and (iii) autoreduction, where film dissolution is coupled to metal dissolution. Such film-growth and dissolution processes, which often produce complex multilayer films, are common in the nuclear industry. A number of examples are discussed