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AbstractAbstract
[en] The movement in semiconductor fabrication towards 'islands of automation', combined with the high cost of maintaining installed capital equipment, demands the optimization of implanter utilization. Presently, skilled process engineers are required to regularly setup and adjust implanter parameters. Any reduction in the number of production hours devoted to ion beam implanter setup or recalibration after a species change would represent substantial improvements in both manpower and equipment utilization. (orig.)
Primary Subject
Source
5. international conference on ion implantation equipment and techniques; Jeffersonville, VT (USA); 23-27 Jul 1984; CODEN: NIMBE.
Record Type
Journal Article
Literature Type
Conference; Numerical Data
Journal
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms; ISSN 0168-583X; ; v. 6(1/2); p. 160-169
Country of publication
Reference NumberReference Number
INIS VolumeINIS Volume
INIS IssueINIS Issue