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AbstractAbstract
[en] An equipment has been designed to extend the scope of control of ion beam flux for an intensive ion beam source used for plasma injection in magnetic vessels. The control equipment is connected to the electromagnet power supply. A consumption regulator is fitted in the operating gas supply to the hollow cathode of the ion source. A circuit is also included for discharge voltage maintenance consisting of a control element and a discharge voltage pick-up. (M.D.). 1 fig
Original Title
Zarizeni k vytvareni ionizacnich paprsku
Primary Subject
Source
30 Aug 1988; 13 Nov 1980; 14 p; CS PATENT DOCUMENT 258003/B1/; SU PRIORITY 3003866/18-25; Priority date: 13 Nov 1980
Record Type
Patent
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