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AbstractAbstract
[en] Low temperature molecular beam epitaxy regrowths of Ga1-xMnxAs (x≅0.04) diluted magnetic semiconductors on GaAs/In1-yGayP/GaAs(001) and In1-yGayP/GaAs(001) (y≅0.51) heterostructures prepared by metal-organic chemical vapor deposition are described. The resulting Ga1-xMnxAs properties are comparable to epitaxial films grown directly on GaAs (001) substrates from in situ reflection high-energy electron diffraction, x-ray diffraction, magnetometry, and transport measurements with magnetic ordering temperature of as-grown films to range between ∼50 and ∼60 K. Postgrowth low temperature annealing enhances both magnetic and transport properties. Perfect etch selectivity between Ga1-xMnxAs/GaAs and In1-yGayP is utilized to realize suspended Ga1-xMnxAs/GaAs doubly clamped beam micromechanical freestanding structures
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Source
(c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
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Journal Article
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ARSENIC COMPOUNDS, ARSENIDES, CHEMICAL COATING, COHERENT SCATTERING, CRYSTAL GROWTH METHODS, DEPOSITION, DIFFRACTION, EPITAXY, FILMS, GALLIUM COMPOUNDS, HEAT TREATMENTS, INDIUM COMPOUNDS, MANGANESE COMPOUNDS, MATERIALS, PHOSPHIDES, PHOSPHORUS COMPOUNDS, PNICTIDES, SCATTERING, SEMICONDUCTOR JUNCTIONS, SEMICONDUCTOR MATERIALS, SURFACE COATING, SURFACE FINISHING, TRANSITION ELEMENT COMPOUNDS
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