[en] The MC3-II/WR is a medium-current ion implanter, newly developed by SEN Corporation. The most significant change from the original MC3-II is an expansion of its energy coverage with an extended terminal voltage from 260 kV to 320 kV. This expansion takes in a large portion of high energy applications and results in significant cost reduction of device production. The MC3-II system was developed to meet requirements of advanced LSI's, especially requirements for implant accuracy through its controllability of beam quality, keeping productivity high or. The MC3-II/WR inherits the MC3-II's advantages and enhances its capability in the energy region and mechanical throughput.