[en] Negative resist materials comprising soluble, film-forming polymers with side branches containing vinyl silyl groups are used for pattern generation on exposure to high energy radiation such as electron beams or x-rays

[en] In order to develop new polymeric track detectors of high sensitivity, we have introduced sulphonate groups to thermosetting resins with a three-dimensional network structure. The test sample of the co-polymer of CR-39 with diethylene glycol bis(allyl sulphonate), DEAS, shows about three times higher sensitivity than that of CR-39 for 6 MeV alpha particles and 1.7 GeV n^-1 iron nuclei. The sensitivity for protons, however, has not yet been increased. The further improvement of this sample, SR-86, will open new fields of application for track detectors. (author)

[en] In order to develop new polymeric track detectors of high sensitivity, we have introduced sulphonate groups to thermosetting resins with three dimensional network structure. The test sample of the copolymer of CR-39 with diethylene glycol bis (allyl sulphonate), DEAS, shows about three times higher sensitivity than that of CR-39 for 6 MeV alpha particles and 1.7 GeV/n iron nuclei. (author)

[en] SR-86 is a new polymeric track detector made by co-polymerizing CR-39 monomer with diethylene glycol bis(allyl sulphonate), DEAS. This detector is about three times more sensitive than CR-39 to alpha particles and high energy heavy ions. However, its sensitivity to protons is slightly lower than that of CR-39. In an attempt to improve the sensitivity of SR-86 to protons, we studied extensively the effects of co-polymerization and etching conditions. These studies provided some useful information about the mechanism of track formation in polymers. (author)