[en] This paper explores the key developments in thin film resistive trimming geometry for use in the fabrication of discrete precision resistors. Firstly an introduction to the laser trimming process is given with respect to well established trim geometries such as the plunge, 'L' and serpentine cuts. The effect of these trim patterns on key electrical properties of resistance tolerance and temperature co-efficient of resistance (TCR) of the thin films is then discussed before the performance of more recent geometries such as the three-contact and random trim approaches are reviewed. In addition to the properties of the standard trim patterns, the concept of the heat affected zone (HAZ) and ablation energy and the effect of introducing a 'fine' trim in areas of low current density to improve device performance are also studied. It is shown how trimming geometry and laser parameters can be systematically controlled to produce thin film resistors of the required properties for varying applications such as high precision, long term stability and high power pulse performance

[en] The temperature dependence of the band gap of GaN_xSb_1−x films with has been studied in the 1.1–3.3 m (0.35–1.1 eV) range using infrared absorption spectroscopy between 4.2 and 300 K. As with other dilute nitride semiconductors, the temperature dependence of the band gap is reduced by alloying with nitrogen when compared to the host binary compound. However, for GaNSb, the smallest variation of the band gap with temperature is observed for samples with the lowest N content for which the band gap is almost totally insensitive to temperature changes. This contrasts with the more widely studied GaN_xAs_1−x alloys in which the band gap variation with temperature decreases with increasing N content. The temperature-dependent absorption spectra are simulated within the so-called band anticrossing model of the interaction between the extended conduction band states of the GaSb and the localized states associated with the N atoms. The N next-nearest neighbor pair states are found to be responsible for the temperature insensitivity of the band gap of the GaNSb alloys as a result of their proximity to the conduction band edge giving them a more pronounced role than in GaNAs alloys. (paper)

[en] The properties of molecular beam epitaxy-grown InSb_1−xBi_x alloys are investigated. Rutherford backscattering spectrometry shows that the Bi content increases from 0.6% for growth at 350 °C to 2.4% at 200 °C. X-ray diffraction indicates Bi-induced lattice dilation and suggests a zinc-blende InBi lattice parameter of 6.626 Å. Scanning electron microscopy reveals surface InSbBi nanostructures on the InSbBi films for the lowest growth temperatures, Bi droplets at intermediate temperatures, and smooth surfaces for the highest temperature. The room temperature optical absorption edge was found to change from 172 meV (7.2 μm) for InSb to ∼88 meV (14.1 μm) for InSb_0.976Bi_0.024, a reduction of ∼35 meV/%Bi

[en] Molecular-beam epitaxy has been used to grow GaSb_1−xBi_x alloys with x up to 0.05. The Bi content, lattice expansion, and film thickness were determined by Rutherford backscattering and x-ray diffraction, which also indicate high crystallinity and that >98% of the Bi atoms are substitutional. The observed Bi-induced lattice dilation is consistent with density functional theory calculations. Optical absorption measurements and valence band anticrossing modeling indicate that the room temperature band gap varies from 720 meV for GaSb to 540 meV for GaSb_0.95Bi_0.05, corresponding to a reduction of 36 meV/%Bi or 210 meV per 0.01 Å change in lattice constant

[en] Contactless electroreflectance is applied to study the band gap (E₀) and spin-orbit splitting (Δ_SO) in InP_1−xBi_x alloys with 0 < x ≤ 0.034. The E₀ transition shifts to longer wavelengths very significantly (−83 meV/% Bi), while the E₀ + Δ_SO transition shifts very weakly (−13 meV/% Bi) with the rise of Bi concentration. These changes in energies of optical transitions are discussed in the context of the valence band anticrossing model and ab initio calculations. Shifts of E₀ and E₀ + Δ_SO transitions, obtained within ab-initio calculations, are −106 and −20 meV per % Bi, respectively, which is in a good agreement with experimental results