[en] Optical metrology tools, especially for short wavelengths (extreme ultraviolet and x-ray), must cover a wide range of spatial frequencies from the very low, which affects figure, to the important mid-spatial frequencies and the high spatial frequency range, which produces undesirable scattering. A major difficulty in using surface profilometers arises due to the unknown point-spread function (PSF) of the instruments [G. D. Boreman, Modulation Transfer Function in Optical and Electro-Optical Systems (SPIE, Bellingham, WA, 2001)] that is responsible for distortion of the measured surface profile. Generally, the distortion due to the PSF is difficult to account for because the PSF is a complex function that comes to the measurement via the convolution operation, while the measured profile is described with a real function. Accounting for instrumental PSF becomes significantly simpler if the result of measurement of a profile is presented in the spatial frequency domain as a power spectral density (PSD) distribution [J. W. Goodman, Introduction to Fourier Optics, 3rd ed. (Roberts and Company, Englewood, CO, 2005)]. For example, measured PSD distributions provide a closed set of data necessary for three-dimensional calculations of scattering of light by the optical surfaces [E. L. Church et al., Opt. Eng. (Bellingham) 18, 125 (1979); J. C. Stover, Optical Scattering, 2nd ed. (SPIE Optical Engineering Press, Bellingham, WA, 1995)]. The distortion of the surface PSD distribution due to the PSF can be modeled with the modulation transfer function (MTF), which is defined over the spatial frequency bandwidth of the instrument. The measured PSD distribution can be presented as a product of the squared MTF and the ideal PSD distribution inherent for the system under test. Therefore, the instrumental MTF can be evaluated by comparing a measured PSD distribution of a known test surface with the corresponding ideal numerically simulated PSD. The square root of the ratio of the measured and simulated PSD distributions gives the MTF of the instrument. The applicability of the MTF concept to phase map measurements with optical interferometric microscopes needs to be experimentally verified as the optical tool and algorithms may introduce nonlinear artifacts into the process. In previous work [V. V. Yashchuk et al., Proc. SPIE 6704, 670408 (2007); Valeriy V. Yashchuk et al., Opt. Eng. (Bellingham) 47, 073602 (2008)] the instrumental MTF of a surface profiler was precisely measured using reference test surfaces based on binary pseudorandom (BPR) gratings. Here, the authors present results of fabricating and using two-dimensional (2D) BPR arrays that allow for a direct 2D calibration of the instrumental MTF. BPR sequences are widely used in engineering and communication applications such as global position systems and wireless communication protocols. The ideal BPR pattern has a flat 'white noise' response over the entire range of spatial frequencies of interest. The BPR array used here is based on the uniformly redundant array (URA) prescription [E. E. Fenimore and T. M. Cannon, Appl. Opt. 17, 337 (1978)] initially used for x-ray and gamma ray astronomy applications. The URA's superior imaging capability originates from the fact that its cyclical autocorrelation function very closely approximates a delta function, which produces a flat PSD. Three different size BPR array patterns were fabricated by electron beam lithography and induction coupled plasma etching of silicon. The basic size units were 200, 400, and 600 nm. Two different etch processes were used, CF₄/Ar and HBr, which resulted in undercut and vertical sidewall profiles, respectively. The 2D BPR arrays were used as standard test surfaces for MTF calibration of the MicroMap(trademark)-570 interferometric microscope using all available objectives. The MicroMap(trademark)-570 interferometric microscope uses incoherent illumination from a tungsten filament source and common path modulated phase shifting interference to produce a set of interferograms detected on a change coupled device. Mathematical algorithms applied to the datasets yield the surface phase map. The HBr etched two-dimensional BPR arrays have proven to be a very effective calibration standard making possible direct calibration corrections without the need of additional calculation considerations, while departures from the ideal vertical sidewall require an additional correction term for the CF₄/Ar etched samples [Samuel K. Barber et al., Abstract to Optics and Photonics 2009: Optical Engineering and Applications Symposium, San Diego, CA, 2-6 August 2009]. Initial surface roughness of low cost 'prime' wafers limits low magnification calibration but should not be a limitation if better polished samples are used.

[en] A modulation transfer function (MTF) calibration method based on binary pseudorandom (BPR) gratings and arrays has been proven to be an effective MTF calibration method for interferometric microscopes and a scatterometer. Here we report on a further expansion of the application range of the method. We describe the MTF calibration of a 6 in. phase shifting Fizeau interferometer. Beyond providing a direct measurement of the interferometer's MTF, tests with a BPR array surface have revealed an asymmetry in the instrument's data processing algorithm that fundamentally limits its bandwidth. Moreover, the tests have illustrated the effects of the instrument's detrending and filtering procedures on power spectral density measurements. The details of the development of a BPR test sample suitable for calibration of scanning and transmission electron microscopes are also presented. Such a test sample is realized as a multilayer structure with the layer thicknesses of two materials corresponding to the BPR sequence. The investigations confirm the universal character of the method that makes it applicable to a large variety of metrology instrumentation with spatial wavelength bandwidths from a few nanometers to hundreds of millimeters.

[en] We describe a revolutionary new approach to high spectral resolution soft x-ray optics. Conventionally in the soft x-ray energy range, high spectral resolution is obtained by use of a relatively low line density grating operated in 1st order with small slits. This severely limits throughput. This limitation can be removed by use of a grating either in very high order, or with very high line density, if one can maintain high diffraction efficiency. We have developed a new technology for achieving both of these goals which should allow high throughput spectroscopy, at resolving powers of up to 10⁶ at 1 keV. Such optics should provide a revolutionary advance for high resolution lifetime free spectroscopy, such as RIXS, and for pulse compression of chirped beams. We report recent developmental fabrication and characterization of a prototype grating optimized for 14.2 nm EUV light. The prototype grating with a 200 nm period of the blazed grating substrate coated with 20 Mo/Si bilayers with a period of 7.1 nm demonstrates good dispersion in the third order (effective groove density of 15,000 lines per mm) with a diffraction efficiency of more than 33%.

[en] Deposition of multilayers on saw-tooth substrates is a key step in the fabrication of multilayer blazed gratings (MBG) for extreme ultraviolet and soft x-rays. Growth of the multilayers can be perturbed by shadowing effects caused by the highly corrugated surface of the substrates, which results in distortion of the multilayer stack structure and degradation of performance of MBGs. To minimize the shadowing effects, we used an ion-beam sputtering machine with a highly collimated atomic flux to deposit Mo/Si multilayers on saw-tooth substrates. The sputtering conditions were optimized by finding a balance between smoothening and roughening processes in order to minimize degradation of the groove profile in the course of deposition and at the same time to keep the interfaces of a multilayer stack smooth enough for high efficiency. An optimal value of energy of 200 eV for sputtering Kr⁺ ions was found by deposition of test multilayers on flat substrates at a range of ion energies. Two saw-tooth substrates were deposited at energies of 200 eV and 700 eV for the sputtering ions. It was found that reduction of the ion energy improved the blazing performance of the MBG and resulted in a 40% gain in the diffraction efficiency due to better replication of the groove profile by the multilayer. As a result of the optimization performed, an absolute diffraction efficiency of 28.8% was achieved for the 2nd blaze order of the MBG with a groove density of 7350 lines/mm at a wavelength of 13.5 nm. Details of the growth behavior of the multilayers on flat and saw-tooth substrates are discussed in terms of the linear continuous model of film growth.

[en] Multilayer-coated Blazed Gratings (MBG) can offer high diffraction efficiency in a very high diffraction order and are therefore of great interest for high-resolution EUV and soft x-ray spectroscopy techniques such as Resonance Inelastic X-ray Scattering. However, realization of the MBG concept requires nano-scale precision in fabrication of a saw-tooth substrate with atomically smooth facets, and reproduction of the blazed groove profile in the course of conformal growth of a multilayer coating. We report on recent progress achieved in the development, fabrication, and characterization of ultra-dense MBGs for EUV and soft x-rays. As a result of thorough optimization of all steps of the fabrication process, an absolute diffraction efficiency as high as 44% and 12.7% was achieved for a 5250 l/mm grating in the EUV and soft x-ray regions respectively. This work now shows a direct route to achieving high diffraction efficiency in high order at wavelengths throughout the soft x-ray energy range with revolutionary applications in synchrotron science.