AbstractAbstract
[en] Nontoxic concentrations of harman and norharman were tested in cultured Chinese hamster cells for their effects on DNA repair and mutagenesis. The following effects of harman were observed: (a) the survival of ultraviolet light- or x-ray-damaged cells was reduced; (b) the ultraviolet light-induced unscheduled DNA synthesis was slightly inhibited; and (c) the frequency of spontaneous or ultraviolet light-induced ouabain-resistant (ouar) or 6-thioguanine-resistant (6-TGr) mutations was reduced. Furthermore, the effect of harman on survival and mutagenesis was greater than that of norharman and was detected primarily in treatments in which cells were exposed to harman immediately following ultraviolet light irradiation. Our data clearly indicate that harman decreases the capacity to repair DNA damage and fix mutations in Chinese hamster cells, possibly because of the intercalation properties of this compound
Primary Subject
Record Type
Journal Article
Journal
Cancer Research; ISSN 0008-5472; ; v. 38(12); p. 4527-4533
Country of publication
Reference NumberReference Number
INIS VolumeINIS Volume
INIS IssueINIS Issue
AbstractAbstract
[en] Bacterial survival is significantly increased after ultraviolet irradiation in tif sfi cells, provided that the thermosensitive tif mutation has been expressed at 410C before irradiation. This tif-mediated reactivation of ultraviolet irradiated bacteria needs de novo protein synthesis, as is the case for the tif-mediated reactivation of ultraviolet-irradiated phage lambda. However, in striking contrast to the phage reactivation process, this tif-mediated reactivation is no longer associated with mutagenesis. It also requires the presence of the uvrA+ excision function. These results strongly suggest the existence in Escherichia coli K-12 of a repair pathway acting on bacterial deoxyribonucleic acid which is inducible, error free, and uvr dependent
Primary Subject
Record Type
Journal Article
Journal
Journal of Bacteriology; ISSN 0021-9193; ; v. 143(2); p. 703-709
Country of publication
Reference NumberReference Number
INIS VolumeINIS Volume
INIS IssueINIS Issue
AbstractAbstract
[en] In E. coli K12, cell filamentation promoted by tif is enhanced by the lon mutation; in contrast, prophage induction and repair of UV-irradiated phage lambda, also promoted by tif, are not affected by lon. From a tif lon double mutant, 'revertants' having recovered the ability to divide at 410 were isolated, among which most (95%) had also lost heir Lon filamentous phenotype after ultraviolet (UV) irradiation. From these 95% of revertants 94% are suppressed for the whole Tif phenotype, by additional mutations that render them deficient in DNA repair, as judged from their high UV sensitivity; some have been characterized as recA mutants. 1% have recovered a control on cell division at 41% or after UV irradiation by means of secondary mutations altering neither the other phenotypic properties of tif and lon, nor the repair and recombination ability of the cells: in particular, this class of 'revertants' remains thermoinducible upon lysogenisation; the mutations which specifically supress filamentation have been mapped at two loci, sfiA and sfiB, cotransducible respectively with pyrD and leu. In the remaining 5% of revertants that still exhibit an UV-induced filamentous growth, 3% can be tentatively classified as true tif+ revertants; 2% behave as tif thermodependent revertants, showing suppression of Tif (and Lon) phenotype only at 410: 2 recAts have been identified in this class. Non-lysogenic tif lon sfi and tif sfi strains remain viable during prolonged growth at 410. Under these conditions, tif expresses mutator properties, which can be conveniently analyzed in this sfi background. The action of tif, lon and sfi mutations is tentatively interpreted on the basis of a negative control of cell division specifically associated with DNA repair. (orig.)
[de]
In E. coli wird die durch tif angeregte Zellfilamentierung durch die lon-Mutation verstaerkt; die ebenfalls durch tif angeregte Prophageninduktion und Reparatur des UV-bestrahlten Phagen lambda werden dagegen von lon nicht beeinflusst. Aus einer tif-lon-Doppelmutante wurden 'Revertanten' isoliert, die die Faehigkeit besassen, sich bei 410 zu teilen. Die meisten davon (95%) hatten nach UV-Bestrahlung auch ihren filamentoesen Lon-Phaenotyp verloren. Von diesen 95% Revertanten wird in 94% durch weitere Mutationen, die sie, nach ihrer grossen UV-Empfindlichkeit zu urteilen, DNS-reparaturdefizient machen, der gesamte Tif-Phaenotyp unterdrueckt; einige wurden als recA-Mutanten betrachtet. 1% haben durch Sekundaermutationen, die weder die anderen phaenotypischen Eigenschaften von tif und lon noch die Reparatur- und Rekombinationsfaehigkeit dieser Zellen veraendern, ihre Faehigkeit zur Zellteilung bei 410 oder nach UV-Bestrahlung wiedergewonnen. Diese Klasse von Revertanten bleibt vor allem auch nach Lysogenierung thermoinduzierbar, die Mutationen, die spezifisch die Filamentierung unterdruecken, wurden an zwei Loci, sfiA und sfiB gefunden, die mit pyrD bzw. leu kotransduzierbar sind. Von den uebrigen 5% der Revertanten, die noch ein UV-induziertes filamentoeses Wachstum zeigen, koennen 3% tentativ als echte tif+-Revertanten klassifiziert werden; 2% verhalten sich als tif-temperaturabhaengige Revertanten, die nur bei 41% eine Unterdrueckung des Tif-(und Lon)-Phaenotyps zeigen: in dieser Klasse wurden 2 recAts identifiziert. Nicht lysogene tif-lon-sfi- und tif-sfi-Staemme bleiben bei verlaengertem Wachstum bei 410 lebensfaehig. Unter diesen Bedingungen hat tif Mutatoreigenschaften, die auf diesem sfi-Hintergrund gut analysiert werden koennen. Die Wirkung von tif-, lon- und sif-Mutationen wird auf der Basis einer spezifisch mit DNS-Reparatur assoziierten negativen Kontrolle der Zellteilung tentativ interpretiert. (orig./AK)Primary Subject
Source
6 figs.; 6 tabs.; with refs.
Record Type
Journal Article
Journal
Mol. Gen. Genet; v. 140(4); p. 309-332
Country of publication
Reference NumberReference Number
INIS VolumeINIS Volume
INIS IssueINIS Issue
AbstractAbstract
[en] To the test whether the decrease in the recovery of UV-induced oua mutants at low temperature was due to phenotype expression rather than mutation fixation, an experiment was performed. In this experiment, the cells were allowed to repair their DNA damage, to fix and express mutations at high temperature (370C) for 2.5 days. After this mutation fixation and expression period, the cells were exposed to ouabain-containing medium at either high (370C) or low (340C) temepratures. The results indicate that the frequency of oua mutants was drastically reduced when cells were incubated at low temperature. Since the conditions for mutation fixation and expression are the same before exposure to selective medium, the decrease in mutation frequency at low temperature must be due to the unfavorable condition for phenotypic expression of oua mutants in the selective medium under low temperature. (orig./AJ)
Primary Subject
Record Type
Journal Article
Journal
Mutation Research; ISSN 0027-5107; ; v. 91 p. 81-86
Country of publication
Reference NumberReference Number
INIS VolumeINIS Volume
INIS IssueINIS Issue