[en] The invention concerns a hollow cathode ion source in particular suitable to the ion beam sputtering of large targets, to the simultaneous sputtering of several targets for the generation of mixed layers and to the etching of surfaces. A wide ion beam of a high and homogeneous ion density is extracted

[en] The invention has been aimed at developing a broad-beam ion source of simple design and small dimensions and capable of emitting a large-area ion beam. It can be used for etching cleaning and depositing thin layers by ion beam sputtering

[en] The invention has been aimed at developing a single beam ion source of simple design and small dimensions with increased current density in the centre of the ion beam and reduced operating voltage of the gas discharge. The source can be used in transmission electron microscopy

[en] This paper discusses the waste characterizations, the bases of the characterizations, and the characterization impact on criticality safety anaysis results

[en] The text of the paper will include an overview of the methodology used to determine the credible scenarios, summary of the analysis of the results, challenges overcome during compliance and implementation, and cost savings due to reduced operational expanses

[en] Thinning of specimen for transmission electron microscopy is carried out by means of sputtering. Construction, design, and operation parameters of an ion source are presented. Because the plasma is produced by means of hollow cathode glow discharges, no special focusing system is used

[en] In a hollow cathode ion source plasma is produced by a low pressure dc arc discharge. Plasma ion density, electron temperature, and plasma potential are determined by means of Langmuir probes. The relations between discharge and plasma parameters are investigated

[en] A measuring device for the determination of plasma parameters, such as ion density, electron temperature, and plasma potential has been developed. The instrument is used for plotting current voltage characteristics of Langmuir probes and for determining the electron velocity distribution in low pressure plasma for microelectronic applications. Measurements in two different ion sources have been carried out in which the plasma is produced either by low pressure dc arc discharge (with glow cathode) or by hollow cathode glow discharge (without glow cathode)

[en] A new broad-beam electron cyclotron resonance (ECR) ion source is presented. It is an ion source with radial waveguide which has a low and space saving construction. Etching studies with different reactive gases and different materials are reviewed. Experimental results are compared with results from ion sources which employ a dc discharge. (author)