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Park, Jong Rak; Lee, Dong Gun; Seo, Hwan Seok; Kim, Dongwan; Kim, Seong Sue; Cho, Han Ku; Kishimoto, Junki; Watanabe, Takeo; Kinoshita, Hiroo
Proceedings of 15th International Symposium on Laser Spectroscopy2008
Proceedings of 15th International Symposium on Laser Spectroscopy2008
AbstractAbstract
[en] We have applied a coherent scattering microscopy (CSM)system to the analysis of aerial images for extreme ultra violet (EUV)masks. Measurements of aerial images for sub 22nm node were performed. Results for critical dimension (CD)measurements showed that reliable actinic CD measurements were possible even down to 12nm node using the CSM system. Detailed descriptions of the system and analysis procedures will be given together with the analysis results for line and space and contact hole patterns of EUV masks for various technology nodes
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Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of); 104 p; Nov 2008; p. 77; 15. International Symposium on Laser Spectroscopy; Daejeon (Korea, Republic of); 13-14 Nov 2008; Available from KAERI (KR); 3 refs, 2 figs
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