[en] An insulated dielectric oxide (IDO) is presented for the dopant-segregated Schottky barrier MOSFETs (DS-SBMOS) to suppress the unwanted on- and off-state leakage currents in short-channel DS-SBMOS. The effects of the IDO on DS-SBMOS are investigated using two-dimensional device simulations. Although the dopant segregation technique can efficiently modify a Schottky barrier to improve Schottky barrier MOSFETs, the performance of scaled DS-SBMOS suffers from degraded short-channel behavior and ambipolar conduction from the extension of a heavily doped segregation layer. With sidewall IDO insulators between the heavily doped N+ segregation layer and P+ halo region, band-to-band and ambipolar leakage currents are simultaneously minimized. Thus, an optimal halo can be utilized to control the short-channel effect without any constraints in problematic leakage currents. Using the IDO architecture, DS-SBMOS can be successfully scaled as a promising candidate for next-generation CMOS devices