[en] In this work, a new method of background subtraction in XPS is suggested considering multiple inelastic scattering in a multilayer inhomogeneous target. The method is based on solution of the problem of multiple inelastic photoelectron scattering in a multilayer plane-parallel target. For a overlayer/substrate system, formulae for subtraction of background generated by multiple inelastic photoelectron scattering are found. It is shown that backgroundы of a spectral line of photoelectrons emitted from the overlayer and emitted from the substrate and inelastically scattered in the overlayer differ significantly. (paper)

[en] Intermediate layers formed by thin NbN films are studied. A surface phase of NbN different from the bulk one under the oxide layer and a layer consisting of NbN_x-SiO_y between the film and the substrate are found. (paper)

[en] This work covers a method of non-destructive layer profiling of ultra-thin films on solid. The method is based on solution of the problem of elastic and inelastic photoelectron scattering in multilayer inhomogeneous films. An example of depth profiling of an air-oxidized ultra-thin chromium film on a silicon substrate is given. (paper)

[en] A new, XPS-based approach to quantitative and nondestructive determination of the chemical and phase layer composition of multicomponent multilayer films is proposed. It includes a new method for subtracting the background of repeatedly inelastically scattered photoelectrons, taking into account the inhomogeneity of inelastic scattering over depth; a new way of decomposing a photoelectron line into component peaks, taking into account the physical nature of various decomposition parameters; solution of the problem of subtracting the background and decomposing the photoelectron line simultaneously; and determination of the thickness of the layers of a multilayer target using a simple equation. The phase-layer composition of nanoscale Nb and NbN films is determined, and the thicknesses of these layers are calculated.

[en] X-ray photoelectron spectroscopy (XPS) depth chemical and phase profiling of air-oxidized niobium nanofilms has been performed. It is found that oxide layer thicknesses depend on the initial thickness of the niobium nanofilm. The increase in thickness of the initial Nb nano-layer is due to increase in thickness of an oxidized layer.