Gruen, D.M.; Liu, Shengzhong; Krauss, A.R.; Pan, Xianzheng.
Argonne National Lab., IL (United States). Funding organisation: USDOE, Washington, DC (United States)1993
Argonne National Lab., IL (United States). Funding organisation: USDOE, Washington, DC (United States)1993
AbstractAbstract
[en] Microwave discharges (2.45 GHz) have been generated in C60-containing Ar produced by flowing Ar over fullerene-containing soot. Optical spectroscopy shows that the spectrum is dominated by the d3Πg-a3Πu Swan bands of C2 and particularly the Δv = -2, -1, 0, +1, and +2 sequences. These results give direct evidence that C2 is one of the products of C60 fragmentation brought about, at least in part, by collisionally induced dissociation (CID). C60 has been used as a precursor in a plasma-enhanced chemical vapor deposition (PECVD) experiment to grow diamond-thin films. The films, grown in an Ar/H2 gas mixture (0.14% carbon content, 100 Torr, 20 sccm Ar, 4 sccm H2, 1500 W, 850 degree C substrate temperature), were characterized with SEM, XRD, and Raman spectroscopy. Growth rate was found to be ∼ 0.6 μ/hr. Assuming a linear dependence on carbon concentration, a growth rate at least six times higher than commonly observed using methane as a precursor, would be predicted at a carbon content of 1% based on C60. Energetic and mechanistic arguments are advanced to rationalize this result based on C2 as the growth species
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Aug 1993; 22 p; CONTRACT W-31109-ENG-38; Also available from OSTI as DE94003209; NTIS; US Govt. Printing Office Dep
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[en] The method of ion assisted vapour deposition (IAD or IVD) for preparing thin films is described. The comparison of the Ag/Si thin film prepared by IVD with those prepared by conventional vacuum vapour deposition has been made. The interface ion mixing of Ag/Si, and the surface microstructure of the Ag/Si thin films are measured by RBS, TEM, SEM etc
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National Symposium on Ion Implantation; Emi (China); Nov 1985
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[en] The Al and Ag films made by IVD were significantly modified in both mechanical and electrical properties. The cause lies in the deposition parameters: bombardment energy and ion/atom arrival rate ratio. It was found that the Al film hardness, the Al-Si contact resistivity and the Al-Si adhesion were improved in the deposition range: energy 250-500 eV and arrival ratio 0.06-0.10. (author)
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Ion beam interactions with matter: international symposium on applications of ion beams produced by small accelerators; Jinan (China); 20-24 Oct 1987
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[en] Low-energy H2+ ions were implanted into polysilicon solar cells to passivate the electrically active centers which existed in grains and grain boundaries. The illuminative and dark characteristics of solar cells were significantly improved. Measurements of the optical properties of monosilicon samples showed that the refractive index n was decreased after H2+ bombardment, and the value of the optical band gap Eg was increased from 1.1 eV of monosilicon to 1.3 eV. A thermal stability test was performed after hydrogenation. The refractive index n of hydrogenated samples rose again after annealing above 300degC, but the absorption coefficient α did not change significantly, even after annealing at 900degC for 30 min. (orig.)
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7. international conference on ion beam modification of materials (IBMM-7) and exposition; Knoxville, TN (United States); 9-14 Sep 1990
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Nuclear Instruments and Methods in Physics Research, Section B; ISSN 0168-583X; ; CODEN NIMBE; v. 59/60(pt.2); p. 1110-1112
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AMORPHOUS STATE, ANNEALING, EFFICIENCY, ENERGY GAP, GRAIN BOUNDARIES, HIGH TEMPERATURE, HYDROGEN IONS 1 PLUS, HYDROGENATION, ION IMPLANTATION, MEDIUM TEMPERATURE, MOLECULAR IONS, OPTICAL PROPERTIES, PHOTOVOLTAIC EFFECT, POLYCRYSTALS, SILICON SOLAR CELLS, STABILITY, TEMPERATURE DEPENDENCE, VERY HIGH TEMPERATURE
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