[en] A description of a power electron gun with a plasma cathode is given. Its design is the development of gas-discharge sources of the duaplasmatron type. The basic elements of the gas-discharge source- the gun anode, the gun plasma cathode, the intermediate electrode of the source, and the tungsten thermocathode- are placed in side a high-voltage insulator. The diameter of the plasma cathode can be up to 2 cm, and the length of the accelerating gap- up to 0.3 cm. The discharge chamber is filled with Ar under 0.3 torr pressure. The electron beam focusing is carried out by means of two magnetic lenses, and displacement of the electron beam - by means of a deflecting coil. Experimental data are given on beam current control by modulating the discharge current and also by means of the electromagnetic system of the plasma gas-discharge source. The electron gun described shapes electron beams with a current up to 4.5 A under stationary operating conditions

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[en] A possibility and ways of using electron-beam valves (EBV) in powerful electrotechnical devices are considered. Specifications of EBV-base commutators intended for power supplies on ion injector are given. Volt-ampere characteristics of the EBV 150/150, the EBV 25/70 are presented. A block-diagram of the commutator based on EBV 25/70 for 60 kV, 15 A with fast response of 5 μs is given. Pulse of up to 30 μs duration at current of 700 A was shaped with the use of EBV 150/150. In this case voltage on an accelerating electrode (grid) increases up to 15 kV and the anode voltage approaches 10 kV

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No abstract available

No abstract available

[en] Short communication

[en] The microwave plasma-beam amplifier is designed in centimeter wavelength range. The amplifier has a decelerating structure in the form of a chain of connected resonators. The gas-dynamic system maintains gas pressure in decelerating structure up to 10^-3 torr. Plasma gives a possibility to increase power of microwave radiation by a factor of 2-8 times

[en] Consideration is being given to the switch based on the electron-beam rectifier and its control system, enabling to switch voltage on ionic source with high efficiency. VAELK 50/50 switch is composed of control board, isolation transformer unit, control device and electron-beam AELV 50/100 rectifier. The control system provides for the possibility of load protection from break-downs and its reswitching after electric strength recovery. Results of four switches operation in power supply system of the Ogra-4 ion sources are presented