[en] Gas-ion source generating a 200 mm diameter ion beam with nonuniformity of current density distribution by the beam cross section of ≤±10% and current of up to 30 mA under the accelerating voltage of up to 50 kV is described. Nitrogen, argon and air are used as working gases. Plasma, emitting ions is generated by volumetric reflective discharge, initiated and maintained by electrons injected to it from the supplementary reflective discharge with cold cathodes. Ion acceleration and beam shaping are realized by three-electrode multiaperture ion-optical system

[en] A source of gas ions is described which forms an ion beam of 200 mm in diameter with a current-density-distribution nonuniformity of ≤ ±10% over the cross-section and a current of up to 30 mA at an accelerating voltage of up to 50 kV. Nitrogen, argon, and air were used as working gases. Ion-emitting plasma was generated by a volume reflecting discharge that was initiated and supported by electrons injected from auxiliary reflecting cold-cathode discharge. Ion acceleration and formation of the beam were performed with a three-electrode multiaperture ion-optical system