[en] A new model for analyzing the laser-induced damage process is provided. In many damage pits, the melted residue can been found. This is evidence of the phase change of materials. Therefore the phase change of materials is incorporated into the mechanical damage mechanism of films. Three sequential stages are discussed: no phase change, liquid phase change, and gas phase change. To study the damage mechanism and process, two kinds of stress have been considered: thermal stress and deformation stress. The former is caused by the temperature gradient and the latter is caused by high-pressure drive deformation. The theory described can determine the size of the damage pit

[en] Roles of absorbing defects and structural defects in multilayer under laser radiation were investigated. The HfO₂/SiO₂ dielectric mirrors for 355 nm were prepared by conventional electron beam deposition. Two kinds of HfO₂ with different purity were chosen as the high index material, and impurity content of the materials was accessed by glow discharge mass spectrometer (GDMS) and X-ray photoelectron spectroscopy (XPS). Laser damage testing was performed in both the ''1-on-1'' and ''s-on-1'' regime, using 355 nm pulsed laser at a pulse length of 8 ns. It was found that the single-shot laser-induced damage threshold (LIDT) is much higher than that of the multi-shot, and the absorbing defects hindered the improvement of laser damage resistivity greatly in the single-shot process, but in multi-shot mode the main factor influencing LIDT is accumulation of irreversible changes of structural defects. Optical microscopy and surface profiler were employed in mapping laser-induced damage morphology features after irradiation

[en] The residual stress in ZrO₂ thin films prepared by electron beam evaporation was measured by viewing the substrate deformation using an optical interferometer. The influences of deposition temperature and deposition rate on the residual stress have been studied. The results show that residual stress in ZrO₂ thin films varies from tensile to compressive depending on deposition temperature and deposition rate, respectively. The value of compressive stress increases with the increasing of deposition temperature and deposition rate. At the same time, X-ray diffraction measurement was carried out in order to examine the crystallization behavior of the ZrO₂ thin films as a function of deposition temperature and deposition rate. The relationship between the residual stress and the microstructure has also been discussed

[en] ZrO₂ coatings were deposited on different substrates of Yb:YAG and fused silica by electron beam evaporation. After annealed for 12 h at 673 and 1073 K, respectively, weak absorption of coatings was measured by surface thermal lensing (STL) technique, and then laser-induced damage threshold (LIDT) was determined also. The crystalline phase of ZrO₂ coatings and the size of the crystal grain were investigated by X-ray diffraction. It was found that microstructure of ZrO₂ coatings was dependent on both annealing temperature and substrate structure, and coatings containing monoclinic phases had higher damage threshold than others. Due to the strong absorption of Yb:YAG, damage threshold of coatings on Yb:YAG was much less than that on fused silica

[en] The effects of annealing on structure and laser-induced damage threshold (LIDT) of Ta₂O₅/SiO₂ dielectric mirrors were investigated. Ta₂O₅/SiO₂ multilayer was prepared by ion beam sputtering (IBS), then annealed in air under the temperature from 100 to 400 deg. C. Microstructure of the samples was characterized by X-ray diffraction (XRD). Absorption of the multilayer was measured by surface thermal lensing (STL) technique. The laser-induced damage threshold was assessed using 1064 nm free pulsed laser at a pulse length of 220 μs. It was found that the center wavelength shifted to long wavelength gradually as the annealing temperature increased, and kept its non-crystalline structure even after annealing. The absorbance of the reflectors decreased after annealing. A remarkable increase of the laser-induced damage threshold was found when the annealing temperature was above 250 deg. C

[en] Coating stacks of HfO₂/SiO₂ and Ta₂O₅/SiO₂ were separately prepared by electron beam evaporation and dual ion beam sputtering. Damage characteristics at the interlayer interfaces were analyzed after irradiation of the coatings by a 1064 nm laser. The cross-sectional morphologies of damage spots indicated that peeling-off damages always occurred at the interface where the low refractive index material (SiO₂) was deposited on the high refractive index material (HfO₂ or Ta₂O₅). The effects of interface microstructure and components on peeling-off damages were also discussed. The microstructure of the interface was not a major factor that influenced peeling-off damages. Incomplete oxides (SiO_x) and Na, K, Li ions accumulated near the interface and caused the formation of micro-defects layers with nano-sized thicknesses. Micro-defects layers maybe reduced adhesion of different interfaces and formed plasmas by absorbing laser energy. Finally stripping damages happened from micro-defects layers during irradiation by a 1064 nm laser.

[en] Laser conditioning effects of the dielectric mirror coatings with different designs were investigated. Simple quarter-wave ZrO₂:Y₂O₃/SiO₂ mirrors and half-wave SiO₂ over-coated ZrO₂:Y₂O₃/SiO₂ mirror coatings were fabricated by E-beam evaporation (EBE). The absorbance of the samples before and after laser conditioning was measured by surface thermal lensing (STL) technology and the defects density was detected under Nomarski microscope. The enhancement of the laser damage resistance was found after laser conditioning. The dependence of the laser conditioning on the coating design was also observed and the over-coated sample obtained greatest enhancement, whereas the absorbance of the samples did not change obviously. During the sub-threshold fluence raster scanning, the minor damage about defects size was found and the assumption of pre-damage mechanism, based on the functional damage concept, was put forward. The improvement of the laser induced damage threshold (LIDT) was attributed to the benign damage of the defects and the dependence on the coating design owed to the damage growth behavior of different coating designs

[en] Plasma scalding is one of the most typical laser damage morphologies induced by a nanosecond laser with a wavelength of 1053 nm in HfO₂/SiO₂ multilayer films. In this paper, the characteristics of plasma scalds are systematically investigated with multiple methods. The scalding behaves as surface discoloration under a microscope. The shape is nearly circular when the laser incidence angle is close to normal incidence and is elliptical at oblique incidence. The nodular-ejection pit is in the center of the scalding region when the laser irradiates at the incidence angle close to normal incidence and in the right of the scalding region when the laser irradiates from left to right at oblique incidence. The maximum damage size of the scalding increases with laser energy. The edge of the scalding is high compared with the unirradiated film surface, and the region tending to the center is concave. Plasma scald is proved to be surface damage. The maximum depth of a scald increases with its size. Tiny pits of nanometer scale can be seen in the scalding film under a scanning electronic microscope at a higher magnification. The absorptions of the surface plasma scalds tend to be approximately the same as the lower absorptions of test sites without laser irradiation. Scalds do not grow during further illumination pulses until 65 J/cm². The formation of surface plasma scalding may be related to the occurrence of the laser-supported detonation wave.

[en] Relationship between refractive index and packing density of coatings prepared by glancing angle deposition is analyzed and three expressions are given firstly. And then optical characteristics of the graded-index coating, which is deposited as the linear changing of packing density, are discussed from some aspects as positive or negative change, integral periods or have hale period, different periods etc, and more over, the influences of different refractive-index theories on the optical characteristics are compared. Finally, the preparation method, applications and some problem in preparation of the graded coating are discussed separately. (author)

[en] Laser-induced damage of a single 500 nm HfO₂ film and a single 500 nm ZrO₂ film were studied with single- and multi-pulse femtosecond laser. The laser-induced damage thresholds (LIDT) of both samples by the 1-on-1 method and the 1000-on-1 method were reported. It was discovered that the LIDT of the HfO₂ single film was higher than that of the ZrO₂ single film by both test methods, which was explained by simple Keldysh's multiphoton ionization theory. The LIDT of multi-pulse was lower than that of single-pulse for both samples as a result of accumulative effect. (authors)