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AbstractAbstract
[en] A method of forming an interconnect level for VLSI devices is described comprising: forming on planar surface of a VLSI wafer a first silicon dioxide dielectric layer; forming a second layer of a second dielectric material on the top surface of the first layer to produce a composite dielectric; patterning and etching the composite dielectric to produce at least one interconnect channel in the first layer; implanting silicon in the exposed bottom surface of the silicon dioxide interconnect channel through the mask; removing the mask; selectively depositing a refractionary metal in the interconnect channel to fill the channel to the level of the planar top surface of the first layer to thereby form a metal interconnect line, the line and the first layer forming a first planar interconnect level
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24 May 1988; vp; US PATENT DOCUMENT 4,746,621/A/; U.S. Commissioner of Patents, Washington, D.C. 20231, USA, $.50
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Patent
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AbstractAbstract
[en] A photoaffinity analogue of ATP, 4-azido-2-nitrophenyl-adenylyl pyrophosphate (ANAP) has been synthesized to investigate the topographical interaction between the catalytic and the regulatory subunits of the bovine heart type II cAMP-dependent protein kinase. The synthesis involves coupling of 4-azido-2-nitrophenyl phosphate with adenosine 5'-monophosphomorpholidate. ANAP has an absorption maximum at 260 nm (molar absorptivity = 35.4 x 103 M-1 cm-1) and a shoulder at 320 nm. Kinetically, ANAP inhibits the enzyme competitively against ATP with a Ki of 0.37 mM. The catalytic subunit is inactivated by ANAP upon photolysis in the presence of magnesium ion. ATP protects the enzyme from photoinactivation but the regulatory subunit does not. Gel electrophoretic analysis of the enzyme labeled by [14C]ANAP shows that the photoincorporated ANAP is associated mainly with the catalytic subunit, even when the regulator dimer is in twelve fold excess. Little or no ANAP is found incorporated into the regulator subunit. The data suggest that the photoreactive portion of ANAP does not lie within reach of the regulatory protein when the analogue is bound to the catalytic subunit
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76. annual meeting of the Federation of American Society for Experimental Biology; Washington, DC (USA); 8-12 Jun 1986; CONF-8606151--
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Journal Article
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Conference
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Federation Proceedings. Federation of American Societies for Experimental Biology; ISSN 0014-9446; ; CODEN FEPRA; v. 45(6); p. 1548
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ALKALINE EARTH METAL COMPOUNDS, ANIMALS, BODY, CARBON COMPOUNDS, CARDIOVASCULAR SYSTEM, CHEMICAL REACTIONS, DECOMPOSITION, DOMESTIC ANIMALS, ENZYMES, ISOTOPE APPLICATIONS, MAMMALS, NUCLEOTIDES, ORGANIC COMPOUNDS, ORGANS, OXYGEN COMPOUNDS, PHOSPHORUS COMPOUNDS, PHOSPHORUS-GROUP TRANSFERASES, RUMINANTS, SYNTHESIS, TRANSFERASES, VERTEBRATES
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Peng, X.; Sfeir, M.; Zhang, F.; Misewich, J.A.; Wong, S.S.
BROOKHAVEN NATIONAL LABORATORY (United States). Funding organisation: Doe - Office Of Science (United States)2010
BROOKHAVEN NATIONAL LABORATORY (United States). Funding organisation: Doe - Office Of Science (United States)2010
AbstractAbstract
[en] The unique electronic structure and optical properties of double-walled carbon nanotubes (DWNTs) have made them a key focus material of research in recent years. However, the incorporation of DWNTs with quantum dots (QDs) into nanocomposites via a covalent chemical approach as well as the optical properties of the composites have rarely been explored. In particular, we have been interested in this model system to investigate whether nanomaterial heterostructures can provide efficient pathways for charge separation relative to loss mechanisms such as recombination. In this specific work, the synthesis of DWNT-CdSe QD heterostructures obtained by using a conventional covalent protocol has been demonstrated. CdSe QDs with terminal amino groups have been conjugated onto the surfaces of oxidized DWNTs by the formation of amide bonds. The observed trap emission of CdSe is thought to arise from the presence of 2-aminoethanethiol capping ligands and is effectively quenched upon conjugation with the DWNT surface because of the charge transfer from CdSe to DWNTs.
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BNL--91357-2010-JA; KC0202020; AC02-98CH10886; ISSN 1932-7455;
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Journal Article
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Journal of Physical Chemistry. C; ISSN 1932-7447; ; v. 114(19); p. 8766-8773
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Wong, S.S.; Shao, M.; Garrett, M.P.; Xu, X.; Ivanov, I.N.; Hu, B.
Brookhaven National Laboratory (United States). Funding organisation: DOE - Office Of Science (United States)2011
Brookhaven National Laboratory (United States). Funding organisation: DOE - Office Of Science (United States)2011
AbstractAbstract
[en] Effects of single walled carbon nanotubes (SWNTs) on the electroluminescent performance of organic light-emitting diodes (OLEDs) have been investigated by mixing them in a hole-conducting layer and in a light-emitting layer in OLEDs. We found that SWNTs play different roles when used as polymer:SWNT composites in OLEDs. When used in a hole-conducting layer, SWNTs facilitate the charge transport in the transport layer and on the other hand they also act as the exciton quenching centers at the transporting/emitting interface provided their concentration is high enough. When used in a light-emitting layer, SWNTs act as an n-type dopant to increase electron transport in p-type electroluminescent film and subsequently improve the balancing degree of bipolar injection, leading to an enhancement in the electroluminescence efficiency.
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BNL--95249-2011-JA; KC0202020; AC02-98CH10886
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Journal Article
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Organic Electronics; ISSN 1566-1199; ; v. 12(6); p. 1098-1102
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AbstractAbstract
[en] 4-Azido-2-nitrophenyl adenosyl pyrophosphate (ANAP), a new photoaffinity labeled adenosine nucleotide, was synthesized by coupling 4-azido-2-nitrophenyl phosphate and adenosine 5'-monophosphomorpholidate. Radioactive analogues were prepared from either [14C]-AMP or iodination of 4-azido-2-nitrophenol. ANAP was shown to be a competitive inhibitor of glucose-6-phosphate dehydrogenase against NADP with an inhibition constant of 9.5 μM. Iodination of ANAP did not affect its inhibition. Thus ANAP is a good photoaffinity analogue of NADP. It probably will also serve as an analogue of ATP or ADP. (author)
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Journal Article
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Journal of Labelled Compounds and Radiopharmaceuticals; ISSN 0362-4803; ; CODEN JLCRD4; v. 28(4); p. 395-403
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AbstractAbstract
[en] This book reports on applications of CVD metals, focusing on tungsten. The papers summarize results in the understanding of surface reactions; the modeling of reactor and deposition kinetics; the development of blanket and selective tungsten deposition processes; the characterization of tungsten films; and the rapid development in other CVD metals such as copper and aluminum
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1990; 427 p; Materials Research Society; Pittsburgh, PA (USA); 5. tungsten and other advanced metals for VLSI/ULSI applications workshop; San Mateo, CA (USA); 20-21 Sep 1989; CONF-8909348--; ISBN 1-55899-086-2; ; Materials Research Society, 9800 McKnight Rd., Suite 327, Pittsburgh, PA 15237 (USA)
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Book
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Conference
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AbstractAbstract
[en] The use of photoresist, Cr, and SiO2 as etch masks for GaAs/AlGaAs structures in chemically assisted ion beam etching is reported. The optimized etch with a photoresist mask results in a high degree of anisotropy and smooth sidewalls. However, the etched surface contains undesirable features. The etch with a Cr mask is also highly anisotropic, and the etched surface is free of features. The drawback with Cr masks is that the sidewalls are rough. Vertical and smooth sidewalls as well as a featureless surface are obtained with a SiO2 mask. The SiO2 mask has been employed to etch the facets of monolithic GaAs/AlGaAs-based laser structures
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Journal Article
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AbstractAbstract
[en] The thinning of cladding layers of GaAs-AlGaAs graded index separate confinement heterostructure single quantum-well (GRINSCH-SQW) lasers offers several advantages. These advantages include easier fabrication of surface grating-based lasers and ridge lasers, the reduction of growth time and source material use, and the more effective removal of heat due to lower thermal resistance. Experimental results on the GRINSCH-SQW lasers are presented, which show that typical cladding thicknesses of 1.5 to 2 μm are much thicker than is necessary. Lasers with cladding layers as thin as 4500 Angstrom have not shown any increase in the threshold current. Theoretical analysis shows good agreement with the experimental results on the minimum cladding thickness necessary to prevent an increase in the threshold current. The differential quantum efficiency is theoretically considered and is found to be more sensitive to cladding layer thickness
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AbstractAbstract
[en] This paper reports on the development of a planar interconnection technology based on the selective deposition of tungsten (W). The W interconnection technology (WIT) relies on the implanting of Si or W into oxide channels, which are later selectively filled with W. The process inherently yields a planar surface structure after each level of metallization so that no complex planarization techniques are required. A comprehensive study using Si and W implants for the nucleation of selective CVD W in oxide channels has been performed. The experiments demonstrate that a minimum Si concentration of 4.9 x 1021 cm-3 is required to nucleate W on the oxide, whereas a W concentration of less than 7.3 x 1020 cm-3 is needed. The interconnections exhibit a resistivity of 7 x 10-6 Ω · cm for both the Si and W implants. The adhesion of W film on oxide produced with the W implantation is superior to that produced with the Si implantation with no lifting observed on long lines
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Journal Article
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Thomas, D.C.; Cheung, N.W.; Brown, I.G.; Wong, S.S.
Tungsten and other advanced metals for VLSI/ULSI applications 51990
Tungsten and other advanced metals for VLSI/ULSI applications 51990
AbstractAbstract
[en] A comprehensive study using Si and W implants for the nucleation of selective CVD W on oxide has been performed. The etching characteristics of the implanted oxides have also been studied. The experiments demonstrate that a minimum Si concentration of 7.3 x 1021 cm-3 is required to nucleate W on oxide, whereas a W concentration less than 7.3 x 1020 cm-3 is needed. The W implants require a lower concentration because of the reaction involved during the deposition process. The adhesion of W films on oxide produced with W implantation is superior to those produced by Si implantation. Using Si and W implants, W films with a measured resistivity of approximately 7 x 10-6 ohm-cm have been achieved
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Wong, S.S. (Stanford Univ., Stanford, CA (USA)); Furukawa, S. (Tokyo Inst. of Technology, Tokyo (Japan)); 427 p; ISBN 1-55899-086-2; ; 1990; p. 233-242; Materials Research Society; Pittsburgh, PA (USA); 5. tungsten and other advanced metals for VLSI/ULSI applications workshop; San Mateo, CA (USA); 20-21 Sep 1989; CONF-8909348--; Materials Research Society, 9800 McKnight Rd., Suite 327, Pittsburgh, PA 15237 (USA)
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Book
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Conference
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INIS VolumeINIS Volume
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