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Liu, C.; Conley, R.; Macrander, A. T.; Maser, J.; Kang, H. C.; Stephenson, G. B.
Argonne National Laboratory ANL (United States). Funding organisation: USDOE Office of Science (United States)2006
Argonne National Laboratory ANL (United States). Funding organisation: USDOE Office of Science (United States)2006
AbstractAbstract
[en] A multilayer nanostructure of 728 alternating WSi2 and Si layers with thicknesses gradually increasing from 10 to ∼58 nm according to the Fresnel zone-plate formula has been fabricated using dc magnetron sputtering. This structure was analyzed with a scanning electron microscope (SEM) and tested with 19.5-keV synchrotron X-rays after sectioning and polishing. Line focus sizes as small as 30.6 nm have been achieved using a sectioned multilayer in transmission diffraction geometry
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25 Oct 2006; 3 p; 13. International Congress on Thin Films; Stockholm (Sweden); 19-23 Jun 2005; AC02-06CH11357; Available from Argonne National Laboratory ANL (US); Thin Solid Films vol. 515 (2) 654-657;doi 10.1016/j.tsf.2005.12.233
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