Analysis of mass and energy of ions in a high rate, coaxial magnetron sputtering, (2)
Tsukada, T.; Hosokawa, N.; Misumi, T.
Proceedings of the 2nd. symposium on ion sources and application technology1978
Proceedings of the 2nd. symposium on ion sources and application technology1978
AbstractAbstract
No abstract available
Source
Institute of Electrical Engineers of Japan, Tokyo; p. 107-108; 1978; p. 107-108; Institute of Electrical Engineers of Japan; Tokyo, Japan; 2. symposium on ion sources and application technology; Tokyo, Japan; 16 - 18 Feb 1978; Published in summary form only.
Record Type
Book
Literature Type
Conference; Numerical Data
Country of publication
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Descriptors (DEC)
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