[en] A new Mo--N phase has been prepared by rf reactive sputtering. The structure, as determined by x-ray analyses matches well with the hexagonal Mo²C structure. The films were produced by reactively sputtering Mo in a gaseous N² atmosphere in an attempt to prepare thin films of the predicted high T_c superconductor MoN in the B1 phase. By further nitriding these Mo²N films with NH³ at 780 ₀C for 24 h, they appeared more stoichiometric as determined by their superconducting properties. These films are superconducting T_c roughly-equal7 K and have high critical magnetic fields H_c2(0) roughly-equal7.5 T. Varying both the temperature of the substrate between 500 and 900 ₀C, and the power density did not effect the phase of the Mo--N compound