[en] Capacitively coupled RF discharges in a low and high frequency regimes have found a wide application in various scientific and engineering areas. Thus the number of experimental discharge configuration is rather great. The Capacitively coupled RF discharges in a low and high frequency regimes have found a wide application in simplest of them are investigated in detail both theoretically and experimentally, especially those which are related to microelectronics. However RF discharges used for the cleaning of materials and tools due to the effect of discharge plasma are so diverse that it is rather difficult to develop a universal model for its description. More often in capacitive RF discharges on an alternating current a system of independent electrodes is used, and theoretically the discharge between two flat electrodes is studied. In microelectronics, medical engineering and other areas the discharge configuration where one of the electrodes is the closed metallic chamber with located in central section the second electrode and with a volume of several litres can be of great interest. In this contribution the above mentioned configuration is investigated experimentally and theoretically for low ω much-lt ω_pi, ω_pi being ion plasma frequency and high ω much-gt ω_pi frequency regimes. The experiment is relevant to air plasma with pressure 0.1-1 Torr. The theoretical models developed use a kinetic approach. The parameters of discharge are investigated. The results of experimental and theoretical calculations are shown to be in a good agreement