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X-ray diffraction as a nondestructive tool for characterization of thin films, nanocrystalline and refractory materials

Acharya, B.S.; Nayak, B.B.
Trends in NDE science and technology: proceedings of the fourteenth world conference on NDT. V. 21996

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AbstractAbstract

[en] X-ray diffraction has been used as a tool to characterize Bi₂S₃, PbS, CdS and their alloy films. Nickel silicide films grown on silicon substrate have also been characterized for their phase identification. It has been found that Ni₃Si₂ phase grows even at low temperature in presence of some impurities in the film. (author)

Primary Subject

INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY (B1210)

Source

Krishnadas Nair, C.G. (ed.) (Hindustan Aeronautics Ltd., Bangalore (India)); Baldev Raj (ed.) (Metallurgy and Materials Programme, Indira Gandhi Centre for Atomic Research, Kalpakkam (India)); Murthy, C.R.L. (ed.) (Dept. of Aerospace Engineering, Indian Institute of Science, Bangalore (India)); Jayakumar, T. (ed.) (NDT and E Section, DPEND, Indira Gandhi Centre for Atomic Research, Kalpakkam (India)); Indian Society for Non Destructive Testing, Kalpakkam (India); [974 p.]; ISBN 81-204-1124-6;