Mesoscale X-ray diffraction measurement of stress relaxation associated with buckling in compressed thin films
Goudeau, Philippe; Villain, Pascale; Tamura, Nobumichi; Padmore, Howard A.
Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (United States). Funding organisation: USDOE Director, Office of Science. Basic Energy Sciences (United States)2003
Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (United States). Funding organisation: USDOE Director, Office of Science. Basic Energy Sciences (United States)2003
AbstractAbstract
[en] Compressed thin films deposited on substrates may buckle depending on the geometrical and mechanical properties of the film/substrate set. Until recently, the small dimensions of the buckling have prevented measurements of their local in plane internal stress distribution. Using a Scanning X-ray Micro diffraction (mSXRD) technique developed at a 3rd generation x-ray synchrotron source, we obtained thin film internal stress maps for circular blisters and telephone chord buckling with micrometric spatial resolution. A fair agreement was found between the film delamination topology observed by optical microscopy and the measured stress maps. We evidenced residual stress relaxation associated with the film buckling: the top is essentially stress-free while adherent region exhibits large compressive stresses
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LBNL--53307; AC03-76SF00098; Journal Publication Date: 2003
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Journal Article
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