[en] Reliability is of paramount importance for industrial ion-beam systems. However, manufacturing processes often involve the operation of ion sources at elevated temperatures with corrosive and erosive feeds. Under these conditions, the durability of various components, and especially cathodes, may be reduced by physical sputtering and chemical erosion. The duoPlGatron ion source, having two chambers, is well suited to minimizing this problem. The first chamber houses the cathode and serves as an electron generator for the second PIGing, or reflex arc, chamber where most of the extracted ions are created. Consequently, the first chamber can be operated on an inert gaseous feed chosen to maximize filament lifetime, while the second chamber is fed a noxious gas or vapor that gives rise to the ion of interest. This principle has already been applied to a high-current oxygen source that was developed for the Eaton NV-200 high-energy ion implanter. The technique has also been demonstrated with the gases phosphine, arsine, and boron trifluoride as secondary feeds. The present paper reports on the operation of a modified duoPlGatron with vapor genera ed by an external oven. (author)