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META

Negative resistance in ion-implanted Al-Al₂O₃-Au junctions

Hirano, M.; Kuriki, S.; Matsumoto, G.1975

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Primary Subject

MATERIALS SCIENCE (B2500)

Record Type

Journal Article

Journal

Applied Physics Letters; v. 26(3); p. 80-82

Country of publication

Descriptors (DEI)

ALUMINIUM, ALUMINIUM OXIDES, ELECTRIC CONDUCTIVITY, FILMS, GOLD, ION IMPLANTATION, MATERIALS WORKING, MIM JUNCTIONS, PHYSICAL RADIATION EFFECTS

Descriptors (DEC)

ALUMINIUM COMPOUNDS, CHALCOGENIDES, ELECTRICAL PROPERTIES, ELEMENTS, FABRICATION, METALS, OXIDES, OXYGEN COMPOUNDS, PHYSICAL PROPERTIES, RADIATION EFFECTS, SEMICONDUCTOR JUNCTIONS, TRANSITION ELEMENTS

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