[en] In this review some examples are used to show that ion implantation may be a useful tool in the study and application of colour centres and radiation damage in insulating materials. Examples include the diagnostic use of implantation to examine the role of trace impurities in the complex personnel dosimeter system of LiF:Mg:Ti:O. Academic studies to test colour centre models in alkali halides are presented in which the extremes of radiation flux obtainable by ion and molecular ion implantation have been compared to distinguish between alternative defect models. Finally, it is shown that ion implantation may be used to make optical waveguides in insulators. In the work presented using silica glass most of the increase in refractive index results from radiation damage rather than chemical effects of implantation. (author)