ARCNL

We have a unique vacancy to fill! 😊 ARCNL is looking for a new Institute Director. The position of director of our research institute is special! For our researchers and support staff, the director plays a central role, connecting about 100 people and often serving as – quite literally – the center of our attention. ARCNL constitutes of a tight and diverse group of people who work naturally across boundaries, such as the various research disciplines.   For our partners at Dutch universities and our partner ASML, the director is the key point of contact to shape ARCNL’s current and future research program. This role also offers the opportunity to make a significant impact on a larger scale, strengthening the position of semiconductor research in the Netherlands. Additionally, ARCNL is part of the NWO-I network, meaning the director represents ARCNL within this network and collaborates with other institute directors to strengthen the collective impact of our institutes. Being part of the larger collective means that support is available when called for.    These are just a few examples of what the position entails—there’s much more to it! Click the link below for more information, and please share this opportunity in your network. 😊 ARCNL partners: ASML, University of Amsterdam, Vrije Universiteit Amsterdam (VU Amsterdam), University of Groningen, NWO (Dutch Research Council) #vacature #vacancy #director https://lnkd.in/eCpYCKPT  

Luc Assink, a PhD student in the Ion Interactions group of Ronnie Hoekstra, is at the forefront of groundbreaking joint research at Zernike Institute for Advanced Materials in Groningen and ARCNL in Amsterdam. Luc's work is integral to advancing the science behind extreme ultraviolet (EUV) light sources, the key drivers of next-generation lithography machines produced by ASML. Great to see that Luc is featured in Zernike Institute's Advent Calendar! Curious to learn more? Read the post from Zernike Institute below...

Interested in learning more about the TeraTom project and research plans of Paul Planken? Read our news item on the website..... https://lnkd.in/eC5C5Nku

✨ Group leader Paul Planken starts a new project entitled 'TeraTom' together with collaborators, thanks to funding from the National Growth Fund (#groeifonds) 'Future-proof high tech equipment'. Paul's group will work on 2 techniques: measuring sharper images with terahertz light + detecting terahertz light from devices when exposed to visible laser pulses. Leading the project is Jaime Gomez Rivas from Eindhoven University of Technology. 👍 ⚡ The goal of the project is to develop an innovative prototype for the semiconductor industry.

We’ve just released our latest ARCNL newsletter, packed with updates! Some of these highlight recent events, like three PhD students concluding their doctoral journey and commemorating it with a tile on the Theses Wall. Others look ahead to exciting occasions, such as the Farewell Symposium for Stefan Witte on February 26th. Don’t miss this opportunity to say farewell to Stefan and simultaneously learn about the latest advancements in EUV generation and imaging. Would you like to receive our newsletter regularly? Register on our website: https://lnkd.in/e4zSGAjV Read the newsletter here: https://lnkd.in/emjN8Vky

The research group led by Peter Kraus (ARCNL +VU Physics and Astronomy) brings exciting news for those studying extremely small structures, around 100 nanometers in size. 🪕 Kraus and his team use a technique called High Harmonic Generation (HHG) to produce light with ultra-short wavelengths that could make these tiny structures visible. 🚀 ❓ How does it work  A light pulse with a longer wavelength is directed at a gas, where various effects split the light into several higher-order waves with much shorter wavelengths, known as high harmonics.  2️⃣ New Discoveries  In two recent publications, the team announced significant advancements in the field of HHG. In Science Advances, Kevin Murzyn and colleagues describe how they overcame the so-called Abbe diffraction limit using HHG. This breakthrough allows researchers to observe structures smaller than ever before—potentially below 100 nanometers—without relying on fluorescent labels.  In Nature Communications, Sylvianne Roscam Abbing, Nataliia Kuzkova, and their collaborators focused on generating HHG in more complex geometries, particularly in solids. Their work opens the door to more precise and faster measurements in HHG-based microscopy and other applications. 👁️🗨️ Do you want to know more? Check out the website: https://lnkd.in/eu463Cq5

On October 21-23, a record number of 129 participants from many countries attended the successful 2024 Source Workshop in Amsterdam. This premier yearly workshop, with Chinese, Japanese, American and European speakers from industry and academia, focused on the light source technology driving the chip revolution. This year’s edition was kicked off with a keynote presentation from ASML fellow Jan Van Schoot on high-NA lithography (Numerical Aperture), the exciting next step for the industry. The Source Workshop was organized and hosted by ARCNL and EUV Litho, Inc. If you have questions, please contact Oscar Versolato (email: O.Versolato@arcnl.nl), group leader of EUV Plasma Processes at ARCNL: https://lnkd.in/eHJQ2pUg

Imagine catching extremely complex behavior with simple mathematics … John Sheil is still surprised that such a thing is possible, but it is 🙂: Hitting a tin droplet with a powerful laser results in an expanding, extremely hot and dense plasma. Collaborating with researchers from ASML in San Diego, John and members of the ARCNL source department reached a ‘conclusion’: the average charge state of the plasma turns out to always scale with their kinetic energy to the power 0.4. Fascinating science! More on this discovery on the ARCNL website: https://lnkd.in/ejzPzE7C VU Physics and Astronomy

Dr. Alessandro Troglia added his thesis cover to the Theses Wall at ARCNL, celebrating the completion of this last step in his PhD journey. Huge congratulations to Alessandro!   Alessandro’s research explored atomic-scale modifications of metallic coatings to optimize their macroscopic properties. Using a multidisciplinary approach, he applied techniques such as x-ray photoelectron spectroscopy, atomic-force microscopy, and more to unlock new pathways in materials design. The results of his thesis further strengthen the importance of atomic-scale properties in determining the macroscopic behavior, highlighting new ways of innovative materials design.   Reflecting on his time at ARCNL, Alessandro said: "What I enjoyed most was the multidisciplinary nature of my work - using many different techniques to investigate various material properties, which allowed me to broaden my knowledge. ARCNL always felt like home. It was a great environment to work in, with supportive colleagues and opportunities to expand my skills. Plus, it was a lot of fun!"   Now, Alessandro has joined TNO, where he will continue to work on EUV-related projects for the semiconductor industry. Alessandro: "My time at ARCNL prepared me very well for this next step. The experience I gained here has been invaluable for my current role."   We are proud to see Alessandro’s hard work come to fruition and wish him continued success in this new chapter! To learn more about Alessandro’s thesis, visit https://lnkd.in/ecKgQfTr #PhD #Thesis #ThesesWall #EUV #workingatARCNL

Congratulations with the paper Oscar Versolato!