Coherent Corp.’s Post

🔎 Here’s our High NA EUV system like you’ve never seen it before. Fly with us to the heart of the system, where a high-energy laser fires on a microscopic droplet of molten tin to turn it into plasma, emitting EUV light. Anamorphic optics focus this light into a uniform beam and direct it to the reticle, which contains the blueprint of the chip. With the chip pattern now encoded in the light, projection optics focus the pattern onto the silicon wafer. Pattern by pattern, layer by layer, this is how our customers create their most advanced chips. And with High NA EUV, the chip industry will set new benchmarks for transistor density and chip performance to enable the next wave of innovation.

🔎 Here’s our High NA EUV system like you’ve never seen it before. Fly with us to the heart of the system, where a high-energy laser fires on a microscopic droplet of molten tin to turn it into plasma, emitting EUV light. Anamorphic optics focus this light into a uniform beam and direct it to the reticle, which contains the blueprint of the chip. With the chip pattern now encoded in the light, projection optics focus the pattern onto the silicon wafer. Pattern by pattern, layer by layer, this is how our customers create their most advanced chips. And with High NA EUV, the chip industry will set new benchmarks for transistor density and chip performance to enable the next wave of innovation.

🔎 Here’s our High NA EUV system like you’ve never seen it before. Fly with us to the heart of the system, where a high-energy laser fires on a microscopic droplet of molten tin to turn it into plasma, emitting EUV light. Anamorphic optics focus this light into a uniform beam and direct it to the reticle, which contains the blueprint of the chip. With the chip pattern now encoded in the light, projection optics focus the pattern onto the silicon wafer. Pattern by pattern, layer by layer, this is how our customers create their most advanced chips. And with High NA EUV, the chip industry will set new benchmarks for transistor density and chip performance to enable the next wave of innovation.

🔎 Here’s our High NA EUV system like you’ve never seen it before. Fly with us to the heart of the system, where a high-energy laser fires on a microscopic droplet of molten tin to turn it into plasma, emitting EUV light. Anamorphic optics focus this light into a uniform beam and direct it to the reticle, which contains the blueprint of the chip. With the chip pattern now encoded in the light, projection optics focus the pattern onto the silicon wafer. Pattern by pattern, layer by layer, this is how our customers create their most advanced chips. And with High NA EUV, the chip industry will set new benchmarks for transistor density and chip performance to enable the next wave of innovation.

🔎 Here’s our High NA EUV system like you’ve never seen it before. Fly with us to the heart of the system, where a high-energy laser fires on a microscopic droplet of molten tin to turn it into plasma, emitting EUV light. Anamorphic optics focus this light into a uniform beam and direct it to the reticle, which contains the blueprint of the chip. With the chip pattern now encoded in the light, projection optics focus the pattern onto the silicon wafer. Pattern by pattern, layer by layer, this is how our customers create their most advanced chips. And with High NA EUV, the chip industry will set new benchmarks for transistor density and chip performance to enable the next wave of innovation.

🔎 Here’s our High NA EUV system like you’ve never seen it before. Fly with us to the heart of the system, where a high-energy laser fires on a microscopic droplet of molten tin to turn it into plasma, emitting EUV light. Anamorphic optics focus this light into a uniform beam and direct it to the reticle, which contains the blueprint of the chip. With the chip pattern now encoded in the light, projection optics focus the pattern onto the silicon wafer. Pattern by pattern, layer by layer, this is how our customers create their most advanced chips. And with High NA EUV, the chip industry will set new benchmarks for transistor density and chip performance to enable the next wave of innovation.

🔎 Here’s our High NA EUV system like you’ve never seen it before. Fly with us to the heart of the system, where a high-energy laser fires on a microscopic droplet of molten tin to turn it into plasma, emitting EUV light. Anamorphic optics focus this light into a uniform beam and direct it to the reticle, which contains the blueprint of the chip. With the chip pattern now encoded in the light, projection optics focus the pattern onto the silicon wafer. Pattern by pattern, layer by layer, this is how our customers create their most advanced chips. And with High NA EUV, the chip industry will set new benchmarks for transistor density and chip performance to enable the next wave of innovation.