[en] A strategy for fabricating nanoimprint templates with sub-10 nm line and 20 nm pitch gratings is demonstrated, by combining electron beam lithography and atomic layer deposition. This is achieved through pitch division using a spacer double-patterning technique. The nanostructures are then replicated using step-and-repeat ultra-violet assisted nanoimprint lithography. (paper)

[en] Deposition of multilayers on saw-tooth substrates is a key step in the fabrication of multilayer blazed gratings (MBG) for extreme ultraviolet and soft x-rays. Growth of the multilayers can be perturbed by shadowing effects caused by the highly corrugated surface of the substrates, which results in distortion of the multilayer stack structure and degradation of performance of MBGs. To minimize the shadowing effects, we used an ion-beam sputtering machine with a highly collimated atomic flux to deposit Mo/Si multilayers on saw-tooth substrates. The sputtering conditions were optimized by finding a balance between smoothening and roughening processes in order to minimize degradation of the groove profile in the course of deposition and at the same time to keep the interfaces of a multilayer stack smooth enough for high efficiency. An optimal value of energy of 200 eV for sputtering Kr⁺ ions was found by deposition of test multilayers on flat substrates at a range of ion energies. Two saw-tooth substrates were deposited at energies of 200 eV and 700 eV for the sputtering ions. It was found that reduction of the ion energy improved the blazing performance of the MBG and resulted in a 40% gain in the diffraction efficiency due to better replication of the groove profile by the multilayer. As a result of the optimization performed, an absolute diffraction efficiency of 28.8% was achieved for the 2nd blaze order of the MBG with a groove density of 7350 lines/mm at a wavelength of 13.5 nm. Details of the growth behavior of the multilayers on flat and saw-tooth substrates are discussed in terms of the linear continuous model of film growth.

[en] A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate. (paper)

[en] Neural probes are in vivo brain-invasive devices that record and manipulate neural circuits using electricity, light, or drugs. The capability to shine distinct wavelengths and control their respective output locations for activation or deactivation of specific groups of neurons is desirable but remains unachieved. Here, we discuss our probe’s capability to deliver two independently controllable wavelengths (450 and 655 nm) in the location(s) of interest using nanophotonic directional couplers and ring resonators. These nanophotonics are scalable to dozens of outputs without significantly increasing the device’s lateral dimensions. Furthermore, they are entirely passive and thus do not require electrical input that results in heat generation. Besides, we integrate a high number of electrodes for a simultaneous neural activity readout. Thus, we overcome the challenges associated with multicolor illumination for neural devices by exploiting the capability of miniaturizable, passive probes to deliver two different frequencies in several areas of interest. These devices open the path towards investigating the in vivo electrical signal propagation under the individual or simultaneous activation or inhibition of distinct brain regions. (paper)

[en] Pattern collapse of small or high aspect ratio lines during traditional wet development is a major challenge for miniaturization in nanolithography. Here we report on a new dry process which combines high resolution resist exposure with selective laser ablation to achieve high resolution with high aspect ratios. Using a low power 532 nm laser, we dry develop a normally negative tone methyl acetoxy calix(6)arene in positive tone to reveal sub-20 nm half-pitch features in a ∼100 nm film at aspect ratios unattainable with conventional development with ablation time of 1–2 s per laser pixel (∼600 nm diameter spot). We also demonstrate superior negative tone wet development by combining electron beam exposure with subsequent laser exposure at a non-ablative threshold that requires far less electron beam exposure doses than traditional wet development. (paper)

[en] A step and repeat UV nanoimprint lithography process on pre-spin coated resist film is demonstrated for patterning a large area with features sizes down to sub-15 nm. The high fidelity between the template and imprinted structures is verified with a difference in their line edge roughness of less than 0.5 nm (3σ deviation value). The imprinted pattern's residual layer is well controlled to allow direct pattern transfer from the resist into functional materials with very high resolution. The process is suitable for fabricating numerous nanodevices.

[en] Surface acoustic waves (SAWs) are optically excited in periodic nanomagnet arrays and drive the magnetization precession via magnetoelastic coupling. The frequency of this mechanically induced magnetic response is pinned at the SAW frequency over an extended range of applied fields. First, we show by experimental and numerical investigation of materials with different combinations of damping and magnetoelastic coupling strengths that the field-dependent width of this pinned resonance depends only on the effective damping α _eff. Second, we derive an analytical expression for determining α _eff from the Lorentzian lineshape of the field-dependent Fourier amplitude of this resonance. We show that the intrinsic Gilbert damping can be determined in the high field limit by analyzing multiple pinned resonances at different applied fields. This demonstrates that intrinsic damping can be extracted all-optically, despite interactions with nonmagnetic degrees of freedom. We find damping values of 0.027, 0.028 and 0.25 for Ni, Co and TbFe respectively. Finally, the validity of the experimental results is verified by excellent agreement with micromagnetic simulations incorporating the magnetoelastic coupling, which shows that the pinning width is unaffected by the magnetoelastic coupling constant over three orders of magnitude. This finding has implications for the rational design of spintronic devices that involve magnetoelastic effects. (letter)

[en] The effect of the nanoscale array geometry on the interaction between optically generated surface acoustic waves (SAWs) and nanomagnet dynamics is investigated using Time-Resolved Magneto-Optical Kerr Effect Microscopy (TR-MOKE). It is demonstrated that altering the nanomagnet geometry from a periodic to a randomized aperiodic pattern effectively removes the magneto-elastic effect of SAWs on the magnetization dynamics. The efficiency of this method depends on the extent of any residual spatial correlations and is quantified by spatial Fourier analysis of the two structures. Randomization allows observation and extraction of intrinsic magnetic parameters such as spin wave frequencies and damping to be resolvable using all-optical methods, enabling the conclusion that the fabrication process does not affect the damping.