[en] ZnTe homoepitaxial films have been deposited at substrate temperatures between 27 deg. C and 100 deg. C by synchrotron-radiation-excited growth using diethylzinc and diethyltelluride. Effects of diethylzinc transport rate and substrate temperature upon the photoluminescence properties of the ZnTe films have been clarified. Strong deep level emissions centered at 1.85 and 2.1 eV related to defects such as vacancy-impurity complex become emerged with increasing diethylzinc transport rate or substrate temperature. A sharply excitonic emission at 2.375 eV associated with shallow acceptors is observed and neither a donor-acceptor pair recombination nor a deep level luminescence signal is detected in the spectrum of the film grown under the nearly stoichiometric condition, which indicates that ZnTe films of good quality can be grown even at room temperature by this growth technique

[en] Quaternary AlGaInN films with thickness greater than 150 nm are grown on c‐plane GaN‐on‐sapphire templates by metalorganic chemical vapor deposition (MOCVD). The Al${}_x$Ga${}_y$In${}_z$N films near alloy composition lattice‐matching to GaN on sapphire (0.532 ≤ x ≤ 0.716, 0.146 ≤ y ≤ 0.366, and 0.092 ≤ z ≤ 0.182) are confirmed to be epitaxially grown, and they show relatively flat surfaces regardless of their lattice strain and their direction. The crystal mosaicity in the AlGaInN films is observed to take over that of the underlying GaN films. The refractive index of AlGaInN films ranges from ≈2.4 to 2.3 in the whole visible wavelengths, largely independent of their alloy compositions. Spectroscopic ellipsometry and photoluminescence analyses indicate that the MOCVD‐grown AlGaInN films have a certain degree of compositional fluctuation affecting their optical band edges. (© 2019 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)