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Yarema, R.
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: USDOE, Washington, DC (United States)1991
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: USDOE, Washington, DC (United States)1991
AbstractAbstract
[en] In the past few years, ASIC (Application Specific Integrated Circuit) design has become important at Fermilab. The purpose of this paper is to present an overview of the in-house ASIC design activity which has taken place. This design effort has added much value to the high energy physics program and physics capability at Fermilab. The two approaches to ASIC development being pursued at Fermilab are examined by looking at some of the types of projects where ASICs are being used or contemplated. To help estimate the cost of future designs, a cost comparison is given to show the relative development and production expenses for these two ASIC approaches. 5 refs., 14 figs., 7 tabs
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Jun 1991; 15 p; LeCroy conference on electronics for future colliders; Chestnut Ridge, NY (United States); 22 May 1991; CONF-9105187--2; CONTRACT AC02-76CH03000; OSTI as DE91016468; NTIS; INIS; US Govt. Printing Office Dep
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Yarema, R. J.
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: USDOE Office of Energy Research ER (United States)1998
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: USDOE Office of Energy Research ER (United States)1998
AbstractAbstract
[en] Pixelated amorphous silicon arrays used for detecting X-rays have a number of special requirements for the readout electronics. Because the pixel detector is a high density array, custom integrated circuits are very desirable for reading out the column signals and addressing the rows of pixels to be read out. In practice, separate chips are used for readout and addressing. This paper discusses a custom integrated circuit for processing the analog column signals. The chip has 32 channels of low noise integrators followed by sample and hold circuits which perform a correlated double sample. The chip has several programmable features including gain, bandwidth, and readout configuration
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1 Aug 1998; 5 p; 8. European Symposium of Radiation Detectors; Schloss Elmau (Germany); 14-17 Jun 1998; CONF--980676--; ON: DE98058487; BR: KA HEP; AC02-76CH03000; Also available from OSTI as DE00016766; PURL: https://www.osti.gov/servlets/purl/16766-vtgHX5/native/; Supercedes report DE98058487
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Yarema, R.; Kipnis, I.; Kleinfelder, S.; Luo, L.; Milgrome, O.; Sarraj, M.; Yarema, R.; Zimmerman, T.
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: USDOE, Washington, DC (United States)1994
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: USDOE, Washington, DC (United States)1994
AbstractAbstract
[en] In the late 1980's, several versions of a full custom chip called the SVX were built and tested. The chip was designed to be a second generation silicon strip readout chip incorporating new features such as data sparsification for silicon strip detectors. The SVX designed by Stuart Kleinfelder and others at LBL contained 128 channels of electronics and proved to be very popular. Initially the chip was fabricated in 3.0 micron process and later transferred to a 1.2 micron radiation hard process. Based on the success of the first SVX (referred herein as SVXI), a need arose for a third generation device. This new 128 channel device called the SVXII was developed by a collaboration of engineers at Fermilab and Lawrence Berkeley Laboratory. The SVXII, designed in a 1.2 micron process, contains many new features including analog storage and digitization of the analog information. In addition to the new features, the SXVII is intended to operate with interaction times approximately 25 times faster than the original SVX, have the same or better noise characteristics, and have a minimal increase in power. The SVXII is an engineering challenge. This report is a first detailed attempt to introduce the SVXIII to the user. Knowledge of the original SVX and its operation would be helpful and can be obtained from references 1--3
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Jun 1994; 32 p; CONTRACT AC02-76CH03000; Also available from OSTI as DE94015843; NTIS; US Govt. Printing Office Dep
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Yarema, R.; Fermilab
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: US Department of Energy (United States)2006
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: US Department of Energy (United States)2006
AbstractAbstract
[en] Three dimensional integrated circuits are well suited to improving circuit bandwidth and increasing effective circuit density. Recent advances in industry have made 3D integrated circuits an option for HEP. The 3D technology is discussed in this paper and several examples are shown. Design of a 3D demonstrator chip for the ILC is presented
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1 Sep 2006; 5 p; AC02-76CH03000; Available from http://lss.fnal.gov/cgi-bin/find_paper.pl?pub-06-343.pdf; PURL: https://www.osti.gov/servlets/purl/897156-9VQfc1/
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Zimmerman, T.; Sarraj, M.; Yarema, R.
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: USDOE, Washington, DC (United States)1992
Fermi National Accelerator Lab., Batavia, IL (United States). Funding organisation: USDOE, Washington, DC (United States)1992
AbstractAbstract
[en] Work was begun in 1990 on the development of an advanced readout chip (ARC) for silicon strip detectors. Features of the proposed device include compatibility with close bunch spacing and double sided detectors, and on chip analog storage, digitization, and data sparsification. Chip have been designed to check all of these concepts, fabricated in the VTI 2 micron process, and tested. The circuit configurations and test results are presented in this paper
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Nov 1992; 5 p; Nuclear science symposium; Orlando, FL (United States); 26-31 Oct 1992; CONF-921005--15; CONTRACT AC02-76CH03000; OSTI as DE93004750; NTIS; INIS; US Govt. Printing Office Dep
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Yarema, R.
Fermi National Accelerator Laboratory (FNAL), Batavia, IL (United States). Funding organisation: USDOE Office of Science - SC, High Energy Physics (HEP) (SC-25) (United States)1999
Fermi National Accelerator Laboratory (FNAL), Batavia, IL (United States). Funding organisation: USDOE Office of Science - SC, High Energy Physics (HEP) (SC-25) (United States)1999
AbstractAbstract
[en] In 1997 an order was placed with Honeywell for 265 four-inch SVX3 wafers. After the initial delivery, the processing line at Honeywell was switched to 6-inch wafers. It was quickly apparent that there were serious problems on the 6-inch wafers which were not seen on the 4-inch wafers. Wafers from one of the 6-inch lots generally have a high yield and do not exhibit the center-of-the-wafer via problem. It is not known if bad vias will recover or good vias go bad with time, temperature and radiation.
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1 May 1999; 161 p; OSTIID--1336407; AC02-07CH11359; Available from http://lss.fnal.gov/archive/test-tm/2000/fermilab-tm-2081.pdf; PURL: http://www.osti.gov/servlets/purl/1336407/
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Trimpl, M.; Deptuch, G.; Yarema, R.
Fermi National Accelerator Laboratory, Batavia, IL (United States). Funding organisation: US Department of Energy (United States)2010
Fermi National Accelerator Laboratory, Batavia, IL (United States). Funding organisation: US Department of Energy (United States)2010
AbstractAbstract
[en] This paper reports on a SOI detector with drift field induced by the flow of majority carriers. It is proposed as an alternative method of detector biasing compared to standard depletion. N-drift rings in n-substrate are used at the front side of the detector to provide charge collecting field in depth as well as to improve the lateral charge collection. The concept was verified on a 2.5 x 2.5 mm2 large detector array with 20 (micro)m and 40 (micro)m pixel pitch fabricated in August 2009 using the OKI semiconductor process. First results, obtained with a radioactive source to demonstrate spatial resolution and spectroscopic performance of the detector for the two different pixel sizes will be shown and compared to results obtained with a standard depletion scheme. Two different diode designs, one using a standard p-implantation and one surrounded by an additional BPW implant will be compared as well.
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1 Nov 2010; 7 p; 2010 IEEE Nuclear Science Symposium, Medical Imaging Conference, and 17th Room Temperature Semiconductor Detectors Workshop; Knoxville, TN (United States); 30 Oct - 6 Nov 2010; AC02-76CH03000; Available from http://lss.fnal.gov/cgi-bin/find_paper.pl?conf-10-475.pdf; PURL: https://www.osti.gov/servlets/purl/1002008-JHoXk9/
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Deptuch, G.; Demarteau, M.; Hoff, J.; Lipton, R.; Shenai, A.; Yarema, R.; Zimmerman, T.
Fermi National Accelerator Laboratory, Batavia, IL (United States). Funding organisation: US Department of Energy (United States)2010
Fermi National Accelerator Laboratory, Batavia, IL (United States). Funding organisation: US Department of Energy (United States)2010
AbstractAbstract
[en] This paper reports on the current status of the development of International Linear Collider vertex detector pixel readout chips based on multi-tier vertically integrated electronics. Initial testing results of the VIP2a prototype are presented. The chip is the second embodiment of the prototype data-pushed readout concept developed at Fermilab. The device was fabricated in the MIT-LL 0.15 (micro)m fully depleted SOI process. The prototype is a three-tier design, featuring 30 x 30 (micro)m2 pixels, laid out in an array of 48 x 48 pixels.
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1 Oct 2010; 4 p; IEEE International 3D System Integration Conference - 3DIC 2010; Munich (Germany); 16-18 Nov 2010; AC02-76CH03000; Available from http://lss.fnal.gov/cgi-bin/find_paper.pl?conf-10-401.pdf; PURL: https://www.osti.gov/servlets/purl/1002012-lYlAAI/
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AbstractAbstract
[en] Work was begun in 1990 on the development of an advanced readout chip (ARC) for silicon strip detectors. Features of the proposed device include compatibility with close bunch spacing and double sided detectors, and on chip analog storage, digitization, and data sparsification. Chips have been designed to check all of these concepts, fabricated in the VTI 2 micron process, and tested. The circuit configurations and test results are presented in this paper
Source
Institute of Electrical and Electronic Engineers (IEEE) nuclear science symposium and medical imaging conference; Orlando, FL (United States); 25-31 Oct 1992; CONF-921005--
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[en] A description is given of the R and D program underway at Fermilab to develop a pixel readout ASIC appropriate for use at the Tevatron collider. Results are presented from tests performed on the first prototype pixel readout chip designed at Fermilab, and a new readout architecture is described. (author)
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S0168900299004210; Copyright (c) 1999 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: India
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Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment; ISSN 0168-9002; ; CODEN NIMAER; v. 435(1-2); p. 144-152
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