Transport and thermodynamic properties across the metal-insulator transition
AbstractAbstract
[en] Recent experimental and theoretical work on the metal-insulator transition in phosphorous doped silicon (Si:P) is reviewed. Selected transport and thermodynamic properties of uncompensated and compensated samples are compared with the predictions of the scaling theory of localization and with the local moment theory. The implications for the breakdown of Landau's Fermi-liquid theory are discussed. (orig.)
Primary Subject
Source
19. international conference on low temperature physics (LT-19); Brighton (UK); 16-22 Aug 1990
Record Type
Journal Article
Literature Type
Conference
Journal
Country of publication
Descriptors (DEI)
AMORPHOUS STATE, BREAKDOWN, DOPED MATERIALS, ELECTRIC CONDUCTIVITY, ELECTRON DENSITY, ELECTRON SPIN RESONANCE, FERMI GAS MODEL, MAGNETIC SUSCEPTIBILITY, PHOSPHORUS ADDITIONS, REVIEWS, SCALING LAWS, SILICON, SPECIFIC HEAT, TEMPERATURE DEPENDENCE, THERMODYNAMIC PROPERTIES, THERMODYNAMICS, ULTRALOW TEMPERATURE
Descriptors (DEC)
Reference NumberReference Number
INIS VolumeINIS Volume
INIS IssueINIS Issue