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Reactive Plasma Etching (RPE) is critical in fabricating Very Large Scale Integrated (VLSI) circuits. It involves the removal of material from a substrate using a chemically reactive plasma. This technique has become indispensable due to its ability to achieve high precision, anisotropy, and selectivity, which are paramount in creating the intricate patterns required for modern microelectronic devices.  https://lnkd.in/gkjrrYZF

Reactive Plasma Etching in VLSI Technology

Reactive Plasma Etching in VLSI Technology

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