Kun Yuan, Jae-Seok Yang, David Z. Pan. Double patterning layout decomposition for simultaneous conflict and stitch minimization. In Gi-Joon Nam, Prashant Saxena, editors, Proceedings of the 2009 International Symposium on Physical Design, ISPD 2009, San Diego, California, USA, March 29 - April 1, 2009. pages 107-114, ACM, 2009. [doi]
Abstract is missing.